中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Fabrication of ZnO submicrorod films with water repellency by surface etching and hydrophobic modification

文献类型:期刊论文

作者Zhou F(周峰)
刊名Thin Solid Films
出版日期2011
卷号519页码:7813-7816
关键词Zinc oxide Microrods Etching Water-repellent films 1H Self-assembled monolayers 1H 2H 2H-Perfluorodecyltriethoxysilane
ISSN号0040-6090
通讯作者侯现明
中文摘要Superhydrophobic ZnO submicrorod films have been fabricated on zinc sheets through an H2O2-assisted surface etching process and subsequent surface modification with a monolayer of 1H,1H,2H,2H- perfluorodecyltriethoxysilane (FDS). The crystal structure, chemical compositions, morphologies, and wettability of the resultant ZnO films were analyzed by means of X-ray diffraction, X-ray photoelectron spectroscopy, scanning electron microscopy, and water contact angle measurements. It is found that the surface of the as-prepared ZnO films on zinc substrate was hydrophobic with a water contact angle of 95±2°, whereas after modification with FDS, the film exhibited superhydrophobicity and the water CA increased to 154±2°. It is shown that both the higher surface roughness and the lower surface free energy play an important role in creating the superhydrophobic films.
学科主题材料科学与物理化学
收录类别SCI
资助信息the Excellent Talents Program in Taishan University (Y07-2-05);the Opening Foundation of the State Key Laboratory of Solid Lubrication at the Lanzhou Institute of Chemical Physics (0905)
语种英语
公开日期2012-12-03
源URL[http://210.77.64.217/handle/362003/2318]  
专题兰州化学物理研究所_固体润滑国家重点实验室
推荐引用方式
GB/T 7714
Zhou F. Fabrication of ZnO submicrorod films with water repellency by surface etching and hydrophobic modification[J]. Thin Solid Films,2011,519:7813-7816.
APA 周峰.(2011).Fabrication of ZnO submicrorod films with water repellency by surface etching and hydrophobic modification.Thin Solid Films,519,7813-7816.
MLA 周峰."Fabrication of ZnO submicrorod films with water repellency by surface etching and hydrophobic modification".Thin Solid Films 519(2011):7813-7816.

入库方式: OAI收割

来源:兰州化学物理研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。