中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Band gap energy and bowing parameter of In-rich InAlN films grown by magnetron sputtering

文献类型:期刊论文

作者H. He, Y. G. Cao, R. L. Fu, W. Guo, Z. Huang, M. L. Wang, C. G. Huang, J. Q. Huang and H. Wang
刊名Applied Surface Science
出版日期2010-01
卷号256期号:6页码:1812-1816
关键词semiconducting III-V materials InAlN optical properties magnetron sputtering optical-properties electronic-structure absorption-edge mbe-growth thin-films alxin1-xn sapphire epitaxy
ISSN号0169-4332
收录类别SCI
原文出处http://ac.els-cdn.com/S0169433209014445/1-s2.0-S0169433209014445-main.pdf?_tid=fd8b6b53e511e6ee4fecb6ed88818024&acdnat=1338976937_aeae3728d595e91faa9106cc75123768
语种英语
公开日期2012-11-02
源URL[http://ir.fjirsm.ac.cn/handle/335002/2055]  
专题福建物质结构研究所_中科院福建物质结构研究所_期刊论文
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GB/T 7714
H. He, Y. G. Cao, R. L. Fu, W. Guo, Z. Huang, M. L. Wang, C. G. Huang, J. Q. Huang and H. Wang. Band gap energy and bowing parameter of In-rich InAlN films grown by magnetron sputtering[J]. Applied Surface Science,2010,256(6):1812-1816.
APA H. He, Y. G. Cao, R. L. Fu, W. Guo, Z. Huang, M. L. Wang, C. G. Huang, J. Q. Huang and H. Wang.(2010).Band gap energy and bowing parameter of In-rich InAlN films grown by magnetron sputtering.Applied Surface Science,256(6),1812-1816.
MLA H. He, Y. G. Cao, R. L. Fu, W. Guo, Z. Huang, M. L. Wang, C. G. Huang, J. Q. Huang and H. Wang."Band gap energy and bowing parameter of In-rich InAlN films grown by magnetron sputtering".Applied Surface Science 256.6(2010):1812-1816.

入库方式: OAI收割

来源:福建物质结构研究所

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