Multi-beam exposure apparatus
文献类型：专利
| 作者 | SUNAGAWA, HIROSHI |
| 发表日期 | 2002-10-15 |
| 专利号 | US6466359 |
| 著作权人 | FUJIFILM CORPORATION |
| 国家 | 美国 |
| 文献子类 | 授权发明 |
| 其他题名 | Multi-beam exposure apparatus |
| 英文摘要 | The multi-beam exposure apparatus includes a light source for emitting a specified number of multi-beams spaced apart in a direction of auxiliary scanning, a deflecting unit for deflecting the specified number of multi-beams collectively on main scanning lines by a specified number of deflections such that a space between adjacent ones of the specified number of multi-beams is exposed and a main scanning unit for performing main scan of a recording material as it is exposed with the specified number of multi-beams, wherein the space between adjacent ones of the specified number of multi-beams is an integral multiple of (the specified number of deflections +1) multiplied by a pitch of pixels in the direction of auxiliary scanning. |
| 公开日期 | 2002-10-15 |
| 申请日期 | 2001-04-23 |
| 状态 | 失效 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/33728]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | FUJIFILM CORPORATION |
| 推荐引用方式 GB/T 7714 | SUNAGAWA, HIROSHI. Multi-beam exposure apparatus. US6466359. 2002-10-15. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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