Laser irradiation apparatus
文献类型：专利
| 作者 | YAMAZAKI, SHUNPEI; TANAKA, KOICHIRO; TERAMOTO, SATOSHI |
| 发表日期 | 2002-08-27 |
| 专利号 | US6441965 |
| 著作权人 | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
| 国家 | 美国 |
| 文献子类 | 授权发明 |
| 其他题名 | Laser irradiation apparatus |
| 英文摘要 | There are disposed two homogenizers for controlling an irradiation energy density in the longitudinal direction of a laser light transformed into a linear one which is inputtted into the surface to be irradiated. Also, there is disposed one homogenizer for controlling an irradiation energy density in a width direction of the linear laser light. According to this, the uniformity of laser annealing can be improved by the minimum number of homogenizers. |
| 公开日期 | 2002-08-27 |
| 申请日期 | 2001-08-16 |
| 状态 | 失效 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/33753]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
| 推荐引用方式 GB/T 7714 | YAMAZAKI, SHUNPEI,TANAKA, KOICHIRO,TERAMOTO, SATOSHI. Laser irradiation apparatus. US6441965. 2002-08-27. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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