Beam Homogenizer, laser irradiation apparatus, and method of manufacturing a semiconductor device
文献类型：专利
| 作者 | TANAKA, KOICHIRO |
| 发表日期 | 2008-02-05 |
| 专利号 | US7327916 |
| 著作权人 | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
| 国家 | 美国 |
| 文献子类 | 授权发明 |
| 其他题名 | Beam Homogenizer, laser irradiation apparatus, and method of manufacturing a semiconductor device |
| 英文摘要 | The present invention provides a beam homogenizer being equipped with an optical waveguide having a pair of reflection planes provided oppositely, having one end surface into which the laser beam is incident, and having the other end surface from which the laser beam is emitted in the optical system for forming the beam spot. The optical waveguide is a circuit being able to keep radiation light in a certain region and to transmit the radiation light in such a way that the energy flow thereof is guided in parallel with an axis of the channel. |
| 公开日期 | 2008-02-05 |
| 申请日期 | 2004-03-08 |
| 状态 | 授权 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/33885]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
| 推荐引用方式 GB/T 7714 | TANAKA, KOICHIRO. Beam Homogenizer, laser irradiation apparatus, and method of manufacturing a semiconductor device. US7327916. 2008-02-05. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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