中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Processing method of single-crystal substrate

文献类型:专利

作者MORIKAZU, HIROSHI; TAKEDA, NOBORU; SHOTOKUJI, TAKUMI
发表日期2018-10-16
专利号US10103061
著作权人DISCO CORPORATION
国家美国
文献子类授权发明
其他题名Processing method of single-crystal substrate
英文摘要Disclosed herein is a processing method of a single-crystal substrate having a film formed on a front side or a back side thereof to divide the single-crystal substrate along a plurality of preset division lines. The method includes a film removing step of removing the film along the division lines, a shield tunnel forming step of applying a pulsed laser beam having a wavelength which permeates through the single-crystal substrate along the division lines to form shield tunnels, each including a fine hole and an amorphous region shielding the fine hole, in the single-crystal substrate along the division lines, and dividing step of exerting an external force on the single-crystal substrate to which the shield tunnel forming step is performed to divide the single-crystal substrate along the division lines.
公开日期2018-10-16
申请日期2016-03-01
状态授权
源URL[http://ir.opt.ac.cn/handle/181661/34300]  
专题半导体激光器专利数据库
作者单位DISCO CORPORATION
推荐引用方式
GB/T 7714
MORIKAZU, HIROSHI,TAKEDA, NOBORU,SHOTOKUJI, TAKUMI. Processing method of single-crystal substrate. US10103061. 2018-10-16.

入库方式: OAI收割

来源:西安光学精密机械研究所

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