Use of a coefficient of a power curve to evaluate a semiconductor wafer
文献类型：专利
| 作者 | BORDEN, PETER G.; NIJMEIJER, REGINA G.; KLEMME, BEVERLY J. |
| 发表日期 | 2004-11-02 |
| 专利号 | US6812717 |
| 著作权人 | SEMICONDUCTOR PHYSICS LABORATORY, INC. |
| 国家 | 美国 |
| 文献子类 | 授权发明 |
| 其他题名 | Use of a coefficient of a power curve to evaluate a semiconductor wafer |
| 英文摘要 | A coefficient of a function that relates a measurement from a wafer to a parameter used in making the measurement (such as the power of a beam used in the measurement) is determined. The coefficient is used to evaluate the wafer (e.g. to accept or reject the wafer for further processing), and/or to control fabrication of another wafer. In one embodiment, the coefficient is used to control operation of a wafer processing unit (that may include, e.g. an ion implanter), or a heat treatment unit (such as a rapid thermal annealer). |
| 公开日期 | 2004-11-02 |
| 申请日期 | 2001-03-05 |
| 状态 | 授权 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/34478]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | SEMICONDUCTOR PHYSICS LABORATORY, INC. |
| 推荐引用方式 GB/T 7714 | BORDEN, PETER G.,NIJMEIJER, REGINA G.,KLEMME, BEVERLY J.. Use of a coefficient of a power curve to evaluate a semiconductor wafer. US6812717. 2004-11-02. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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