中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Halbleiterlaser, Halbleitervorrichtung und Herstellungsverfahren

文献类型:专利

作者ASANO, TAKEHARU; ASATSUMA, TSUNENORI; HINO, TOMONORI; KOBAYASHI, TAKASHI; TOMIYA, SHIGETAKA; YAMAGUCHI, TAKASHI
发表日期2006-04-06
专利号DE69923919T2
著作权人SONY CORP.
国家德国
文献子类授权发明
其他题名Halbleiterlaser, Halbleitervorrichtung und Herstellungsverfahren
英文摘要In a semiconductor laser made of nitride III-V compound semiconductors and having a ridge-shaped stripe, which is capable of stably controlling transverse modes to prevent high-order mode oscillation during high output power and excellent in heat dissipation, opposite sides of the ridge are buried by a buried semiconductor layer such as AlGaN buried layer made of a nitride III-V compound semiconductor at least of which is a non-single crystal such as polycrystal. The buried semiconductor layer is grown under a growth temperature in the range from 520 DEG C to 760 DEG C.
公开日期2006-04-06
申请日期1999-11-19
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/35325]  
专题半导体激光器专利数据库
作者单位SONY CORP.
推荐引用方式
GB/T 7714
ASANO, TAKEHARU,ASATSUMA, TSUNENORI,HINO, TOMONORI,et al. Halbleiterlaser, Halbleitervorrichtung und Herstellungsverfahren. DE69923919T2. 2006-04-06.

入库方式: OAI收割

来源:西安光学精密机械研究所

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