中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Dielectric wafer level bonding with conductive feed-throughs for electrical connection and thermal management

文献类型:专利

作者CHITNIS, ASHAY; IBBETSON, JAMES
发表日期2016-06-14
专利号US9368428
著作权人CREE, INC.
国家美国
文献子类授权发明
其他题名Dielectric wafer level bonding with conductive feed-throughs for electrical connection and thermal management
英文摘要A method for fabricating semiconductor and electronic devices at the wafer level is described. In this method, dielectric material is used to wafer bond a device wafer to a submount wafer, after which vias can be structured into the submount wafer and dielectric bonding material to access contact pads on the bonded surface of the device wafer. The vias may subsequently be filled with electrically and thermally conducting material to provide electrical contacts to the device and improve the thermal properties of the finished device, respectively. The post-bonding process described provides a method for fabricating a variety of electronic and semiconductor devices, particularly light emitting diodes with electrical contacts at the bottom of the chip.
公开日期2016-06-14
申请日期2007-04-03
状态授权
源URL[http://ir.opt.ac.cn/handle/181661/37311]  
专题半导体激光器专利数据库
作者单位CREE, INC.
推荐引用方式
GB/T 7714
CHITNIS, ASHAY,IBBETSON, JAMES. Dielectric wafer level bonding with conductive feed-throughs for electrical connection and thermal management. US9368428. 2016-06-14.

入库方式: OAI收割

来源:西安光学精密机械研究所

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