中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Nitride semiconductor laser element and method for manufacturing the same

文献类型:专利

作者KAMIKAWA, TAKESHI; KAWAGUCHI, YOSHINOBU
发表日期2010-04-06
专利号US7691653
著作权人SHARP KABUSHIKI KAISHA
国家美国
文献子类授权发明
其他题名Nitride semiconductor laser element and method for manufacturing the same
英文摘要A substrate with a nitride semiconductor layer is cleaved to form resonator end faces, on which a coating film is formed so as to make a nitride semiconductor laser bar. This is divided into nitride semiconductor laser elements. Prior to forming the coating film on the resonator end face, the resonator end face is exposed to a plasma atmosphere generated from the gas containing nitrogen gas. When a ratio of nitrogen to gallium in the surface of the resonator end face before the exposure is represented by “a”, an average value of ratios of nitrogen to gallium inside from the surface of the resonator end face before the exposure is represented by “b”, a ratio of nitrogen to gallium in the surface of the resonator end face after the exposure to the first plasma atmosphere is represented by “d”, and an average value of ratios of nitrogen to gallium inside from the surface of the resonator end face after the exposure is represented by “e”, the value “g” that is expressed by g=(b·d)/(a·e) is set to a value that satisfies g≧0.8.
公开日期2010-04-06
申请日期2006-08-08
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/38308]  
专题半导体激光器专利数据库
作者单位SHARP KABUSHIKI KAISHA
推荐引用方式
GB/T 7714
KAMIKAWA, TAKESHI,KAWAGUCHI, YOSHINOBU. Nitride semiconductor laser element and method for manufacturing the same. US7691653. 2010-04-06.

入库方式: OAI收割

来源:西安光学精密机械研究所

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