中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Nitride semiconductor light emitting device, method of manufacturing nitride semiconductor light emitting device, and nitride semiconductor transistor device

文献类型:专利

作者KAMIKAWA, TAKESHI; KAWAGUCHI, YOSHINOBU
发表日期2011-11-29
专利号US8067255
著作权人SHARP KABUSHIKI KAISHA
国家美国
文献子类授权发明
其他题名Nitride semiconductor light emitting device, method of manufacturing nitride semiconductor light emitting device, and nitride semiconductor transistor device
英文摘要Provided are a nitride semiconductor light emitting device including a coat film formed at a light emitting portion and including an aluminum nitride crystal or an aluminum oxynitride crystal, and a method of manufacturing the nitride semiconductor light emitting device. Also provided is a nitride semiconductor transistor device including a nitride semiconductor layer and a gate insulating film which is in contact with the nitride semiconductor layer and includes an aluminium nitride crystal or an aluminum oxynitride crystal.
公开日期2011-11-29
申请日期2008-06-23
状态授权
源URL[http://ir.opt.ac.cn/handle/181661/38465]  
专题半导体激光器专利数据库
作者单位SHARP KABUSHIKI KAISHA
推荐引用方式
GB/T 7714
KAMIKAWA, TAKESHI,KAWAGUCHI, YOSHINOBU. Nitride semiconductor light emitting device, method of manufacturing nitride semiconductor light emitting device, and nitride semiconductor transistor device. US8067255. 2011-11-29.

入库方式: OAI收割

来源:西安光学精密机械研究所

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