VCSEL with elliptical aperture having reduced rin
文献类型:专利
作者 | GAZULA, DEEPA; CHITICA, NICOLAE; CHACINSKI, MAREK; LANDRY, GARY; TATUM, JIM |
发表日期 | 2019-05-28 |
专利号 | US10305254 |
著作权人 | FINISAR CORPORATION |
国家 | 美国 |
文献子类 | 授权发明 |
其他题名 | VCSEL with elliptical aperture having reduced rin |
英文摘要 | A VCSEL can include: an elliptical oxide aperture in an oxidized region that is located between an active region and an emission surface, the elliptical aperture having a short radius and a long radius with a radius ratio (short radius)/(long radius) being between 0.6 and 0.8, the VCSEL having a relative intensity noise (RIN) of less than −140 dB/Hz. The VCSEL can include an elliptical emission aperture having the same dimensions of the elliptical oxide aperture. The VCSEL can include an elliptical contact having an elliptical contact aperture therein, the elliptical contact being around the elliptical emission aperture. The elliptical contact can be C-shaped. The VCSEL can include one or more trenches lateral of the oxidized region, the one or more trenches forming an elliptical shape, wherein the oxidized region has an elliptical shape. The one or more trenches can be trapezoidal shaped trenches. |
公开日期 | 2019-05-28 |
申请日期 | 2017-09-18 |
状态 | 授权 |
源URL | [http://ir.opt.ac.cn/handle/181661/38525] ![]() |
专题 | 半导体激光器专利数据库 |
作者单位 | FINISAR CORPORATION |
推荐引用方式 GB/T 7714 | GAZULA, DEEPA,CHITICA, NICOLAE,CHACINSKI, MAREK,et al. VCSEL with elliptical aperture having reduced rin. US10305254. 2019-05-28. |
入库方式: OAI收割
来源:西安光学精密机械研究所
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