Wet-processing apparatus
文献类型：专利
| 作者 | YASUAKI NODA; AKIRA FUKUTOMI; TAKAFUMI HAYAMA |
| 发表日期 | 2013-05-15 |
| 专利号 | SG176393A1 |
| 著作权人 | TOKYO ELECTRON LIMITED |
| 国家 | 新加坡 |
| 文献子类 | 发明申请 |
| 其他题名 | Wet-processing apparatus |
| 英文摘要 | WET-PROCESSING APPARATUSA wet-processing apparatus is capable of accurately deciding whether or not a processing liquid was spouted from aprocessing liquid spouting nozzle and whether or not changes occurred in the condition of the processing liquid spouted from the processing liquid spouting nozzle. The wet-processing apparatus, which spouts a coating liquid R supplied from a coating liquid supply unit 7 onto a surface of a substrate W1 ofa substrate W, includes: nozzles 10 each provided with a passage 10e for the coating liquid R; a light source 110 which illuminates an area between a plane containing the tips 10d of the nozzles 10 and the surface W1 of the substrate W; a camera 17, namely, an imaging device, for forming an image of the areabetween the plane containing the tips 10d of the nozzles 10, and the surface W1 of the substrate W; a control unit 9a which provides a spout signal requesting spouting the coating liquid R from the nozzle 10 toward the substrate W, and an imaging signal requesting the camera 17 to start an imaging operation; and a decision unit which decides whether or not the processing liquid was spouted from the nozzle 10 and whether or not changes occurred in the condition of the processing liquid R spouted from the nozzle 10 toward the substrate W on the basis of an image formed by the camera 17 and expressing thebrightness of the coating liquid R spouted toward the substrate W and illuminated by light emitted by the light source 110.Fig. 3 |
| 公开日期 | 2011-12-29 |
| 申请日期 | 2011-05-19 |
| 状态 | 授权 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/38554]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | TOKYO ELECTRON LIMITED |
| 推荐引用方式 GB/T 7714 | YASUAKI NODA,AKIRA FUKUTOMI,TAKAFUMI HAYAMA. Wet-processing apparatus. SG176393A1. 2013-05-15. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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