中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Method of manufacturing ridge-type semiconductor laser

文献类型:专利

作者YAGI, HIDEKI
发表日期2014-02-04
专利号US8642365
著作权人SUMITOMO ELECTRIC INDUSTRIES, LTD.
国家美国
文献子类授权发明
其他题名Method of manufacturing ridge-type semiconductor laser
英文摘要A method of manufacturing a ridge-type semiconductor laser includes the steps of forming a stacked semiconductor layer including an active layer and an etch stop layer on first and second surfaces of a substrate, etching the stacked semiconductor layer on the second surface, forming a semiconductor portion on the second surface, forming a ridge waveguide portion by etching the stacked semiconductor layer on the first surface to a first depth, forming semiconductor diffraction grating portions by etching the semiconductor portion to a second depth, and forming a diffraction grating section by providing resin diffraction grating portions between the semiconductor diffraction grating portions. The etching of the stacked semiconductor layer on the first surface and the etching of the semiconductor portion are performed simultaneously by using first and second mask portions.
公开日期2014-02-04
申请日期2012-04-11
状态授权
源URL[http://ir.opt.ac.cn/handle/181661/38596]  
专题半导体激光器专利数据库
作者单位SUMITOMO ELECTRIC INDUSTRIES, LTD.
推荐引用方式
GB/T 7714
YAGI, HIDEKI. Method of manufacturing ridge-type semiconductor laser. US8642365. 2014-02-04.

入库方式: OAI收割

来源:西安光学精密机械研究所

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