Method of making a selective compositional disordering of a GaAs based heterostructure by the in-diffusion of Au through a single crystal, epitaxially grown Ge film
文献类型:专利
作者 | JONES, KENNETH A.; LEE, HOWARD S. |
发表日期 | 1994-09-13 |
专利号 | US5346856 |
著作权人 | UNITED STATES OF AMERICA, THE, AS REPRESENTED BY THE SECRETARY OF THE ARMY. |
国家 | 美国 |
文献子类 | 授权发明 |
其他题名 | Method of making a selective compositional disordering of a GaAs based heterostructure by the in-diffusion of Au through a single crystal, epitaxially grown Ge film |
英文摘要 | A method for producing a buried heterostructure active devices and a passive waveguide by providing a heterostructure substrate such as a superlattice having at least one planar GaAs layer and at least one AlGaAs layer adjacent to it. A single crystal germanium layer is epitaxially deposited on the superlattice substrate. A layer of gold is deposited on the germanium layer. The gold and germanium layers are imagewise patterned and selected portions etched away. The patterned substrate is encapsulated in a compatible, heat resistant encapsulating material. The encapsulated substrate is then annealed at a temperature of up to about 350 DEG C. |
公开日期 | 1994-09-13 |
申请日期 | 1993-05-10 |
状态 | 失效 |
源URL | [http://ir.opt.ac.cn/handle/181661/39012] ![]() |
专题 | 半导体激光器专利数据库 |
作者单位 | UNITED STATES OF AMERICA, THE, AS REPRESENTED BY THE SECRETARY OF THE ARMY. |
推荐引用方式 GB/T 7714 | JONES, KENNETH A.,LEE, HOWARD S.. Method of making a selective compositional disordering of a GaAs based heterostructure by the in-diffusion of Au through a single crystal, epitaxially grown Ge film. US5346856. 1994-09-13. |
入库方式: OAI收割
来源:西安光学精密机械研究所
浏览0
下载0
收藏0
其他版本
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。