中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Method of forming a groove in a semiconductor laser diode and a semiconductor laser diode

文献类型:专利

作者HORIE, HIDEYOSHI; FUJIMORI, TOSHINARI; NAGAO, SATORU; HOSOI, NOBUYUKI; GOTO, HIDEKI
发表日期1996-10-15
专利号US5566198
著作权人MITSUBISHI CHEMICAL CORPORATION
国家美国
文献子类授权发明
其他题名Method of forming a groove in a semiconductor laser diode and a semiconductor laser diode
英文摘要The disclosure describes a method of forming a groove in a structure of a semiconductor laser diode, which comprises a crystal growth procedure of epitaxial growth of a core layer comprising MP, wherein M represents one or more of elements belonging to group IIIb of periodic table and an upper layer comprising MAs, wherein M represents one or more of elements belonging to group IIIb of periodic table, successively on (100) surface of MAs crystals in a lower layer comprising MAs; a photolithography and wet etching procedure of, after forming an etching mask on the upper layer, forming an etching window to the etching mask; a first etching procedure of selective etching the upper layer; and a second etching procedure of selective etching other faces except for the face in which (111) face of MP crystals in the core layer is exposed.
公开日期1996-10-15
申请日期1995-01-30
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/39242]  
专题半导体激光器专利数据库
作者单位MITSUBISHI CHEMICAL CORPORATION
推荐引用方式
GB/T 7714
HORIE, HIDEYOSHI,FUJIMORI, TOSHINARI,NAGAO, SATORU,et al. Method of forming a groove in a semiconductor laser diode and a semiconductor laser diode. US5566198. 1996-10-15.

入库方式: OAI收割

来源:西安光学精密机械研究所

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