レジストパタ-ンの形成方法
文献类型：专利
| 作者 | 岡井 誠; 辻 伸二; 松村 宏善 |
| 发表日期 | 1994-10-19 |
| 专利号 | JP1994082600B2 |
| 著作权人 | HITACHI LTD |
| 国家 | 日本 |
| 文献子类 | 授权发明 |
| 其他题名 | レジストパタ-ンの形成方法 |
| 英文摘要 | PURPOSE:To prevent resists from mixing with one another by a method wherein, when two kinds or more of resists to be mixed with one another are laminated for coating, a base agent of resist hardly mixed with the upper and lower resists is used as an intermediate layer. CONSTITUTION:When two kinds of more of resists to be mixed with one another are laminated for coating, a base agent of resist hardly mixed with the upper and lower resists is used as an intermediate layer 3. For example, when the resists to be mixed with one another are novolak resin base positive resists 2 and novolak base negative resists 4, a cyclizing rubber base resin is used as the intermediate layer 3. Through these procedures, the upper and lower resists can be prevented from mixing with one another. |
| 公开日期 | 1994-10-19 |
| 申请日期 | 1985-12-18 |
| 状态 | 失效 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/41740]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | HITACHI LTD |
| 推荐引用方式 GB/T 7714 | 岡井 誠,辻 伸二,松村 宏善. レジストパタ-ンの形成方法. JP1994082600B2. 1994-10-19. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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