中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
GaInAsP/InP Double-heterostructure lasers

文献类型:专利

作者LIAU, ZONG-LONG; WALPOLE, JAMES N.
发表日期1984-09-04
专利号US4468850
著作权人MASSACHUSETTS INSTITUTE OF TECHNOLOGY, A CORP. OF MASS.
国家美国
文献子类授权发明
其他题名GaInAsP/InP Double-heterostructure lasers
英文摘要A method and apparatus is described wherein a buried double heterostructure laser device is formed utilizing epitaxial layers of quaternary III-V alloys of gallium indium arsenide phosphide and wherein the buried layer is formed by first etching the p-type top layer of the structure down to the quaternary active layer forming a mesa. A second etchant is then provided which preferentially etches the active layer. This etchant is used to undercut the top layer by removing the active layer on both sides of the top mesa surface providing a narrow strip of active layer underneath the undercut mesa. The undercut is then filled in by a heat treatment process which results in migration or transport of the binary top layer and binary bottom layer to fill in the undercut, leaving the active layer buried in the binary material. In an alternate embodiment of the invention, the two-step etching process plus the transport phenomena is utilized to form the mirror surface of a laser device. The device may include a support mesa and control mesa structure and may also be used to fabricate optical waveguide structures.
公开日期1984-09-04
申请日期1982-03-29
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/41745]  
专题半导体激光器专利数据库
作者单位MASSACHUSETTS INSTITUTE OF TECHNOLOGY, A CORP. OF MASS.
推荐引用方式
GB/T 7714
LIAU, ZONG-LONG,WALPOLE, JAMES N.. GaInAsP/InP Double-heterostructure lasers. US4468850. 1984-09-04.

入库方式: OAI收割

来源:西安光学精密机械研究所

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