中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Semiconductor laser and method of fabricating semiconductor laser

文献类型:专利

作者KIMURA, TATSUYA; MIYASHITA, MOTOHALU; MIHASHI, YUTAKA
发表日期2000-01-25
专利号US6018539
著作权人MITSUBISHI DENKI KABUSHIKI KAISHA
国家美国
文献子类授权发明
其他题名Semiconductor laser and method of fabricating semiconductor laser
英文摘要A semiconductor laser includes a first conductivity type semiconductor substrate having a gain region and a spot size changing region adjacent each other; a first conductivity type lower cladding layer disposed on the substrate; an active layer disposed on the lower cladding layer and having a thickness which is uniform in the gain region and gradually decreases in the spot size changing region with distance from the gain region; a second conductivity type upper cladding layer disposed on the active layer and having a stripe-shaped ridge, the ridge extending along the gain region and the spot size changing region; a first electrode disposed on the ridge of the upper cladding layer; and a second electrode disposed on a rear surface of the substrate. Current flow is concentrated in the ridge of the upper cladding layer. Further, when the ridge is fabricated, portions of the active layer in which a current will be injected during operation of the laser are not exposed to the atmosphere and not oxidized, resulting in a highly reliable semiconductor laser with an integrated spot size changing part and gain part.
公开日期2000-01-25
申请日期1998-02-09
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/41839]  
专题半导体激光器专利数据库
作者单位MITSUBISHI DENKI KABUSHIKI KAISHA
推荐引用方式
GB/T 7714
KIMURA, TATSUYA,MIYASHITA, MOTOHALU,MIHASHI, YUTAKA. Semiconductor laser and method of fabricating semiconductor laser. US6018539. 2000-01-25.

入库方式: OAI收割

来源:西安光学精密机械研究所

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