中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Semiconductor laser device and a method for fabricating the same

文献类型:专利

作者TSUNODA, ATSUO
发表日期2003-02-11
专利号US6518159
著作权人SHARP KABUSHIKI KAISHA
国家美国
文献子类授权发明
其他题名Semiconductor laser device and a method for fabricating the same
英文摘要An object of the present invention is provide an InGaAlP-based semiconductor layer of a good crystal quality at a higher temperature up to a re-evaporating temperature by MBE process. A buffer layer made of GaAs and a buffer layer made of GaInP are formed by MBE (molecular beam epitaxy) process on a GaAs substrate having a facet, which is to be a main facet, inclined by theta in [011] direction from (100) facet. Then semiconductor layers are formed by MBE process so as to include cladding layers having a bandgap Egc and an AlGaInP active layer having a bandgap Ega which is adjusted by an amount of III-group element to be represented by Ega
公开日期2003-02-11
申请日期2000-10-19
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/41876]  
专题半导体激光器专利数据库
作者单位SHARP KABUSHIKI KAISHA
推荐引用方式
GB/T 7714
TSUNODA, ATSUO. Semiconductor laser device and a method for fabricating the same. US6518159. 2003-02-11.

入库方式: OAI收割

来源:西安光学精密机械研究所

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