中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Method of manufacturing buried heterostructure semiconductor laser

文献类型:专利

作者KONDO, YASUHIRO
发表日期1993-11-09
专利号US5260230
著作权人NIPPON TELEGRAPH AND TELEPHONE CORPORATION
国家美国
文献子类授权发明
其他题名Method of manufacturing buried heterostructure semiconductor laser
英文摘要According a method of manufacturing a buried heterostructure semiconductor laser, an active layer and a p-type cladding layer are sequentially deposited on an n-type group III-V semiconductor layer by metalorganic vapor phase epitaxy. A surface of the deposited layer is masked in a stripe shape, and the cladding layer, the active layer, and the semiconductor layer are selectively and partially etched to form a mesa structure. A p-type current blocking layer, an n-type current confining layer containing a group VI dopant having a concentration of not less than 5x1018 atomsxcm-3, a p-type cladding layer, and a p-type cap layer are sequentially deposited on an entire upper surface of the mesa structure by the metalorganic vapor phase epitaxy.
公开日期1993-11-09
申请日期1992-07-07
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/41945]  
专题半导体激光器专利数据库
作者单位NIPPON TELEGRAPH AND TELEPHONE CORPORATION
推荐引用方式
GB/T 7714
KONDO, YASUHIRO. Method of manufacturing buried heterostructure semiconductor laser. US5260230. 1993-11-09.

入库方式: OAI收割

来源:西安光学精密机械研究所

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