中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
MOCVD growth of InGaN quantum well laser structures on a grooved lower waveguiding layer

文献类型:专利

作者ROMANO, LINDA T.; HOFSTETTER, DANIEL; PAOLI, THOMAS L.
发表日期2001-09-04
专利号US6285698
著作权人XEROX CORPORATION
国家美国
文献子类授权发明
其他题名MOCVD growth of InGaN quantum well laser structures on a grooved lower waveguiding layer
英文摘要Group III-V nitride semiconductors are used as light emitters for optoelectronic devices. To provide the desired range of bandgaps and band offsets in heterostructure devices, InGaN layers have to be grown. InGaN layers are difficult to grow because poor lattice mismatch between group III-V nitride alloys. Thus, a plurality of gratings or grooves are formed in the group III-V nitride layer in order to relieve strain between the group III-V nitride layer and the active region. The plurality of gratings allows segregation of In in a manner that optimizes the wavelength of light produced.
公开日期2001-09-04
申请日期1998-09-25
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/41998]  
专题半导体激光器专利数据库
作者单位XEROX CORPORATION
推荐引用方式
GB/T 7714
ROMANO, LINDA T.,HOFSTETTER, DANIEL,PAOLI, THOMAS L.. MOCVD growth of InGaN quantum well laser structures on a grooved lower waveguiding layer. US6285698. 2001-09-04.

入库方式: OAI收割

来源:西安光学精密机械研究所

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