Process of producing diffraction grating
文献类型：专利
| 作者 | SUGIMOTO, HIROSHI; MATSUI, TERUHITO; OHTSUKA, KEN-ICHI; ABE, YUJI; OHISHI, TOSHIYUKI |
| 发表日期 | 1996-07-30 |
| 专利号 | US5540345 |
| 著作权人 | MITSUBISHI DENKI KABUSHIKI KAISHA |
| 国家 | 美国 |
| 文献子类 | 授权发明 |
| 其他题名 | Process of producing diffraction grating |
| 英文摘要 | A process of producing a diffraction grating includes the steps of forming a coating layer on a first diffraction grating layer of a resin formed on a substrate without damaging the diffraction grating layer, removing a portion of the coating layer positioned on the first diffraction grating layer by etching to form a second diffraction grating layer of the coating layer having the reverse phase to that of the first diffraction grating layer, removing the first diffraction grating layer, and etching the substrate with a mask of the second diffraction grating layer, so that the diffraction grating having the reverse phase can be easily produced. When the first diffraction grating layer is left and both the first and second diffraction grating layers are used as a mask, the diffraction grating having a period half times as large as that of the first grating layer can be easily produced. |
| 公开日期 | 1996-07-30 |
| 申请日期 | 1993-12-27 |
| 状态 | 失效 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/42030]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | MITSUBISHI DENKI KABUSHIKI KAISHA |
| 推荐引用方式 GB/T 7714 | SUGIMOTO, HIROSHI,MATSUI, TERUHITO,OHTSUKA, KEN-ICHI,et al. Process of producing diffraction grating. US5540345. 1996-07-30. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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