中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Method of fabricating semiconductor laser device and semiconductor laser device

文献类型:专利

作者DOI, MASATO; OOHATA, TOYOHARU
发表日期2004-12-14
专利号US6831937
著作权人SONY CORPORATION
国家美国
文献子类授权发明
其他题名Method of fabricating semiconductor laser device and semiconductor laser device
英文摘要A method of fabricating a semiconductor laser device includes the steps of forming semiconductor layers composed of a first conductive type cladding layer, an active layer, and a second conductive type cladding layer on a substrate, and peeling a device formation region of the semiconductor layers from the substrate and simultaneously forming a resonance mirror on an end portion of the device formation region by irradiating the device formation region with energy beams traveling from the back surface side of the substrate. With this configuration, it is possible to peel a device from a substrate and also form a flat resonance mirror with less damage of crystal by laser abrasion, and further to easily form a high quality resonance mirror without increasing the number of fabrication steps.
公开日期2004-12-14
申请日期2002-07-31
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/42231]  
专题半导体激光器专利数据库
作者单位SONY CORPORATION
推荐引用方式
GB/T 7714
DOI, MASATO,OOHATA, TOYOHARU. Method of fabricating semiconductor laser device and semiconductor laser device. US6831937. 2004-12-14.

入库方式: OAI收割

来源:西安光学精密机械研究所

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