中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Epitaxial Wurtzite growth structure for semiconductor light-emitting device

文献类型:专利

作者MATSUOKA, TAKASHI; SASAKI, TORU
发表日期1991-04-09
专利号US5006908
著作权人NIPPON TELEGRAPH AND TELEPHONE CORPORATION
国家美国
文献子类授权发明
其他题名Epitaxial Wurtzite growth structure for semiconductor light-emitting device
英文摘要An epitaxial growth structure for a semiconductor light-emitting device includes a sapphire substrate having a (0110) face (substantially M face), and a wurtzite type Group III nitride mixed crystal semiconductor single crystal film epitaxially grown on the substrate. A semiconductor light-emitting device includes the sapphire substrate having a (0110) face (substantially M face), the wurtzite type Group III nitride mixed crystal semiconductor single crystal film epitaxially grown on the substrate, an insulating film formed on the single crystal film, and a metal electrode formed on the insulating film.
公开日期1991-04-09
申请日期1990-02-12
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/42312]  
专题半导体激光器专利数据库
作者单位NIPPON TELEGRAPH AND TELEPHONE CORPORATION
推荐引用方式
GB/T 7714
MATSUOKA, TAKASHI,SASAKI, TORU. Epitaxial Wurtzite growth structure for semiconductor light-emitting device. US5006908. 1991-04-09.

入库方式: OAI收割

来源:西安光学精密机械研究所

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