中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
A▲l▼GaInP半導体発光素子

文献类型:专利

作者小林 健一
发表日期1996-10-03
专利号JP2564813B2
著作权人日本電気株式会社
国家日本
文献子类授权发明
其他题名A▲l▼GaInP半導体発光素子
英文摘要PURPOSE:To facilitate the manufacture of a semiconductor light emitting element by determining the thickness of a clad layer remaining on an active layer not by the thickness of the remaining film by etching but by the thickness of the clad layer laminated in advance to always control it constantly. CONSTITUTION:A double hetero structure composed of an active layer 1 and clad layers 2, 3 made of GalnP or AlGaInP is provided on a GaAs substrate 10. An etching stopper layer 7 made of AlGaAs is laminated thereon, and layers for forming a ridge-shaped guide mechanism made of AlGaInP clad layer 4, a current block layer 5 are laminated thereon. Thus, the difficulty of mesa etching process to occur in the step of manufacturing in the conventional case is eliminated.
公开日期1996-12-18
申请日期1987-01-21
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/42358]  
专题半导体激光器专利数据库
作者单位日本電気株式会社
推荐引用方式
GB/T 7714
小林 健一. A▲l▼GaInP半導体発光素子. JP2564813B2. 1996-10-03.

入库方式: OAI收割

来源:西安光学精密机械研究所

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