Method for manufacturing semiconductor optical integrated device with optical waveguide regions
文献类型：专利
| 作者 | NODA, YUKIO; SUZUKI, MASATOSHI; KUSHIRO, YUKITOSHI; AKIBA, SHIGEYUKI |
| 发表日期 | 1989-04-11 |
| 专利号 | US4820655 |
| 著作权人 | KDDI CORPORATION |
| 国家 | 美国 |
| 文献子类 | 授权发明 |
| 其他题名 | Method for manufacturing semiconductor optical integrated device with optical waveguide regions |
| 英文摘要 | A method for manufacturing a semiconductor optical integrated device in which a semiconductor element A having an optical waveguide region and a semiconductor element B having another optical waveguide region are integrated on a single substrate. In accordance with the present invention, there is provided steps of growing the optical waveguide region of the semiconductor element A and a protective layer therefor are grown on the entire area of the substrate surface, selectively removing them from the substrate surface in the region to be ultimately occupied by the semiconductor element B, and forming in the region the optical waveguide region of the semiconductor element B through crystal growth. |
| 公开日期 | 1989-04-11 |
| 申请日期 | 1987-02-18 |
| 状态 | 失效 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/42387]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | KDDI CORPORATION |
| 推荐引用方式 GB/T 7714 | NODA, YUKIO,SUZUKI, MASATOSHI,KUSHIRO, YUKITOSHI,et al. Method for manufacturing semiconductor optical integrated device with optical waveguide regions. US4820655. 1989-04-11. |
入库方式： OAI收割
来源：西安光学精密机械研究所
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