中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Semiconductor structure with flared mesa burying layers

文献类型:专利

作者NELSON, ANDREW W.; HOBBS, RICHARD E.; DEVLIN, W. JOHN; LENTON, CHARLES G.
发表日期1990-06-19
专利号US4935936
著作权人BRITISH TELECOMMUNICATIONS PLC
国家美国
文献子类授权发明
其他题名Semiconductor structure with flared mesa burying layers
英文摘要A semiconductor structure and methods for making it, for use in opto-electronic devices, employs only MOVPE growth steps. The structure is based on a mesa having substantially non-reentrant sides. To make it, an initial semiconductor structure is produced which comprises a substrate with a mesa thereon, the mesa having a self-aligned, central stripe of metal organic vapour phase growth suppressing material on its uppermost surface. Burying layers are then grown by MOVPE at either side of the mesa, the stripe removed, and covering layers grown over the mesa and adjoining regions of the burying layers. To make an opto-electronic device, a silica window can be formed on the uppermost surface of the covering layers and contacts provided through the window and to the remote face of the substrate. Two methods of making the initial semiconductor structure are described. Devices such as optical detectors and waveguides can be made using methods according to the invention. Particularly importantly, semiconductor lasers which will operate in a single transverse mode can be made.
公开日期1990-06-19
申请日期1989-02-22
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/42399]  
专题半导体激光器专利数据库
作者单位BRITISH TELECOMMUNICATIONS PLC
推荐引用方式
GB/T 7714
NELSON, ANDREW W.,HOBBS, RICHARD E.,DEVLIN, W. JOHN,et al. Semiconductor structure with flared mesa burying layers. US4935936. 1990-06-19.

入库方式: OAI收割

来源:西安光学精密机械研究所

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