Tunnel junctions for long-wavelength VCSELs
文献类型:专利
作者 | BHAT, RAJARAM; NISHIYAMA, NOBUHIKO |
发表日期 | 2005-08-23 |
专利号 | US6933539 |
著作权人 | THORLABS QUANTUM ELECTRONICS, INC. |
国家 | 美国 |
文献子类 | 授权发明 |
其他题名 | Tunnel junctions for long-wavelength VCSELs |
英文摘要 | A tunnel junction device (102) with minimal hydrogen passivation of acceptors includes a p-type tunnel junction layer (106) of a first semiconductor material doped with carbon. The first semiconductor material includes aluminum, gallium, arsenic and antimony. An n-type tunnel junction layer (104) of a second semiconductor material includes indium, gallium, arsenic and one of aluminum and phosphorous. The junction between the p-type and an-type tunnel junction layers forms a tunnel junction (110). |
公开日期 | 2005-08-23 |
申请日期 | 2004-05-17 |
状态 | 授权 |
源URL | [http://ir.opt.ac.cn/handle/181661/43117] ![]() |
专题 | 半导体激光器专利数据库 |
作者单位 | THORLABS QUANTUM ELECTRONICS, INC. |
推荐引用方式 GB/T 7714 | BHAT, RAJARAM,NISHIYAMA, NOBUHIKO. Tunnel junctions for long-wavelength VCSELs. US6933539. 2005-08-23. |
入库方式: OAI收割
来源:西安光学精密机械研究所
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