Nanoscale friction behavior of the Ni-film/substrate system under scratching using MD simulation
文献类型：期刊论文
| 作者 | Liu XM(刘小明) ; Liu ZL; Wei YG(魏悦广); Liu, XM
|
| 刊名 | TRIBOLOGY LETTERS
 |
| 出版日期 | 2012-05-01 |
| 卷号 | 46期号:2页码:167-178 |
| 通讯作者邮箱 | xiaomingliu@lnm.imech.ac.cn |
| 关键词 | Nanotribology Friction reducing Friction mechanisms Films Dynamic modeling Molecular-Dynamics Simulation Randomly Rough Surfaces Dislocation Nucleation Atomistic Simulation Contact Mechanics Film Thickness Thin-Films Nanoindentation Deformation Multilayers |
| ISSN号 | 1023-8883 |
| 产权排序 | [Liu, X. M.;Wei, Y. G.] Chinese Acad Sci, Inst Mech, LNM, Beijing 100190, Peoples R China; [Liu, Z. L.] Northwestern Univ, Dept Mech Engn, Evanston, IL 60208 USA |
| 通讯作者 | Liu, XM ; Chinese Acad Sci, Inst Mech, LNM, Beijing 100190, Peoples R China. |
| 合作状况 | 国际 |
| 中文摘要 | The friction behavior of the nanoscratching process is investigated using molecular dynamic simulations by considering a sphere indenter sliding against a nickel nanofilm structure. In the film/substrate system, the interface-dominated friction process is studied during the nanoscratch process. The results indicate that the interface accommodates deformation during the scratch by absorbing plastic deformation (such as stacking faults and partial dislocations) and by allowing locally interface slip. The observed local material shuffling beneath the tip that was strongly affected by the interface and friction mechanisms, including material ploughing along the track, filling in of the track, and piling up of the chip in front of the tip, are discussed. The combination effects of both scratching depths and film thicknesses were also investigated. |
| 学科主题 | 新型材料的力学问题 |
| 收录类别 | SCI ; EI |
| 资助信息 | This work was supported by the National Natural Science Foundation of China ( Grants Nos. 10772096, 11021262, 10932011 and 91116003), and by the National Basic Research Program of China through 2012CB937500. The authors gratefully acknowledge useful discussions with Prof. F. P. Yuan from LNM at the Institute of Mechanics, Chinese Academy of Sciences. |
| 原文出处 | http://dx.doi.org/10.1007/s11249-012-9932-9 |
| 语种 | 英语 |
| WOS记录号 | WOS:000302251500008 |
| 公开日期 | 2013-01-18 |
| 源URL | [http://dspace.imech.ac.cn/handle/311007/46703]  |
| 专题 | 力学研究所_非线性力学国家重点实验室 |
| 通讯作者 | Liu, XM |
| 推荐引用方式 GB/T 7714 | Liu XM,Liu ZL,Wei YG,et al. Nanoscale friction behavior of the Ni-film/substrate system under scratching using MD simulation[J]. TRIBOLOGY LETTERS,2012,46(2):167-178. |
| APA | 刘小明,Liu ZL,魏悦广,&Liu, XM.(2012).Nanoscale friction behavior of the Ni-film/substrate system under scratching using MD simulation.TRIBOLOGY LETTERS,46(2),167-178. |
| MLA | 刘小明,et al."Nanoscale friction behavior of the Ni-film/substrate system under scratching using MD simulation".TRIBOLOGY LETTERS 46.2(2012):167-178. |
入库方式： OAI收割
来源：力学研究所
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