Hydrogen bonding and halogen bonding co-existing in the reaction of heptafluorobenzyl iodide with N,N,N ',N '-tetramethylethylene diamine
文献类型：期刊论文
| 作者 | Zhu SZ(朱仕正) ; Xing CH(邢春晖) ; Xu W(许伟) ; Li ZT(黎占亭) |
| 刊名 | Tetrahedron Lett.
 |
| 出版日期 | 2004 |
| 卷号 | 45期号:4页码:777-780 |
| ISSN号 | 0040-4039 |
| 其他题名 | 七氟苄基碘与N,N,N',N'四甲基乙二胺的反应中的氢键与卤键作用 |
| 通讯作者 | 朱仕正 ; 黎占亭 |
| 英文摘要 | Two novel assembling systems 3 and 4, with the structures of C6F5CF2-...H+N(Me)(2)CH2CH2(Me-2)N+H...-CF2C6F5 and C6F5CF2I...N(Me)(2)CH2CH2(Me)(2)N...ICF2C6F5, respectively, have been generated from the solution of heptafluorobenzyl iodide 1 and N,N,N',N'-tetramethylethylenediamine 2 in dichloromethane. Their structures have been characterized by X-ray diffraction analysis, NMR and IR spectroscopy. Intermolecular N...I halogen bond and F...H hydrogen bond are revealed to be the driving forces for their formation. (C) 2003 Elsevier Ltd. All rights reserved. |
| 学科主题 | 有机氟化学 |
| 收录类别 | SCI |
| 原文出处 | http://dx.doi.org/10.1016/j.tetlet.2003.11.100 |
| 语种 | 英语 |
| WOS记录号 | WOS:000187897900028 |
| 公开日期 | 2013-01-18 |
| 源URL | [http://202.127.28.38/handle/331003/14330]  |
| 专题 | 上海有机化学研究所_中科院有机氟化学重点实验室 |
| 推荐引用方式 GB/T 7714 | Zhu SZ,Xing CH,Xu W,et al. Hydrogen bonding and halogen bonding co-existing in the reaction of heptafluorobenzyl iodide with N,N,N ',N '-tetramethylethylene diamine[J]. Tetrahedron Lett.,2004,45(4):777-780. |
| APA | 朱仕正,邢春晖,许伟,&黎占亭.(2004).Hydrogen bonding and halogen bonding co-existing in the reaction of heptafluorobenzyl iodide with N,N,N ',N '-tetramethylethylene diamine.Tetrahedron Lett.,45(4),777-780. |
| MLA | 朱仕正,et al."Hydrogen bonding and halogen bonding co-existing in the reaction of heptafluorobenzyl iodide with N,N,N ',N '-tetramethylethylene diamine".Tetrahedron Lett. 45.4(2004):777-780. |
入库方式： OAI收割
来源：上海有机化学研究所
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