中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Molecular dynamics simulation of deposition and growth of cu thin film on si substrate

文献类型:会议论文

作者Zhang J(张俊); Liu C(刘崇); Shu YH(舒勇华); Fan J(樊菁)
出版日期2012
会议名称28th International Symposium on Rarefied Gas Dynamics (RGD)
会议日期JUL 09-13, 2012
会议地点Zaragoza, SPAIN
关键词Thin film growth crystalline structure and orientation surface roughness molecular dynamics EMBEDDED-ATOM METHOD SURFACES SYSTEMS METALS
卷号1501
页码919-925
通讯作者Zhang, J (reprint author), Chinese Acad Sci, State Key Lab High Temp Gas Dynam, Inst Mech, Beijing 100190, Peoples R China.
中文摘要Growth and properties of Cu thin film deposited on Si substrate is studied using molecular dynamics method. Tersoff potential parameters for the interaction between Cu and Si are fitted to reproduce the lattice structure of copper silicide. We focus on the growth mode, crystalline structure and orientation, and surface morphology of Cu thin film. The effect of substrate temperature on the crystalline orientation and surface roughness is studied.
收录类别CPCI
产权排序[Zhang, Jun; Liu, Chong; Shu, Yonghua; Fan, Jing] Chinese Acad Sci, State Key Lab High Temp Gas Dynam, Inst Mech, Beijing 100190, Peoples R China
会议网址http://dx.doi.org/10.1063/1.4769640
会议录28TH INTERNATIONAL SYMPOSIUM ON RAREFIED GAS DYNAMICS 2012, VOLS. 1 AND 2
会议录出版者AMER INST PHYSICS
学科主题Engineering ; Aerospace; Astronomy & Astrophysics
会议录出版地2 HUNTINGTON QUADRANGLE, STE 1NO1, MELVILLE, NY 11747-4501 USA
语种英语
ISSN号0094-243X
ISBN号978-0-7354-1115-9
源URL[http://dspace.imech.ac.cn/handle/311007/46815]  
专题力学研究所_高温气体动力学国家重点实验室
推荐引用方式
GB/T 7714
Zhang J,Liu C,Shu YH,et al. Molecular dynamics simulation of deposition and growth of cu thin film on si substrate[C]. 见:28th International Symposium on Rarefied Gas Dynamics (RGD). Zaragoza, SPAIN. JUL 09-13, 2012.http://dx.doi.org/10.1063/1.4769640.

入库方式: OAI收割

来源:力学研究所

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