Electrodeposition and characterization of nanocrystalline CoNiFe films
文献类型：期刊论文
| 作者 | Y. Chen ; Q. P. Wang ; C. Cai ; Y. N. Yuan ; F. H. Cao ; Z. Zhang ; J. Q. Zhang |
| 刊名 | Thin Solid Films
 |
| 出版日期 | 2012 |
| 卷号 | 520期号:9页码:3553-3557 |
| 关键词 | Nanocrystalline CoNiFe film Electrodeposition Cyclic voltammetry Impedance spectroscopy feconi thin-films electrochemical nucleation ingot iron impedance corrosion kinetics behavior coercivity aluminum density |
| ISSN号 | 0040-6090 |
| 中文摘要 | Nanocrystalline Co45Ni10Fe24 films have been fabricated using cyclic voltammetry technique from the solutions containing sulfate, then characterized by scanning electron microscopy, X-ray diffraction and vibrating sample magnetometer. Meanwhile, Electrochemical Impedance Spectroscopy technique has been employed to probe into the nucleation/growth behavior of Co45Ni10Fe24 films. The results show that, the obtained Co45Ni10Fe24 film possesses low coercivity of 973.3 A/m and high saturation magnetic flux density of 1.59 x 10(5) A/m. Under the experimental conditions, the nucleation/growth process of Co45Ni10Fe24 films is mainly under activation control. With the increase of the applied cathodic potential bias, the charge transfer resistance for CoNiFe deposition decreases exponentially. (C) 2012 Elsevier B.V. All rights resented. |
| 原文出处 | |
| 公开日期 | 2013-02-05 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/59912]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | Y. Chen,Q. P. Wang,C. Cai,et al. Electrodeposition and characterization of nanocrystalline CoNiFe films[J]. Thin Solid Films,2012,520(9):3553-3557. |
| APA | Y. Chen.,Q. P. Wang.,C. Cai.,Y. N. Yuan.,F. H. Cao.,...&J. Q. Zhang.(2012).Electrodeposition and characterization of nanocrystalline CoNiFe films.Thin Solid Films,520(9),3553-3557. |
| MLA | Y. Chen,et al."Electrodeposition and characterization of nanocrystalline CoNiFe films".Thin Solid Films 520.9(2012):3553-3557. |
入库方式： OAI收割
来源：金属研究所
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