中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Tunable Band Gaps and p-Type Transport Properties of Boron-Doped Graphenes by Controllable Ion Doping Using Reactive Microwave Plasma

文献类型:期刊论文

作者Y. B. Tang ; L. C. Yin ; Y. Yang ; X. H. Bo ; Y. L. Cao ; H. E. Wang ; W. J. Zhang ; I. Bello ; S. T. Lee ; H. M. Cheng ; C. S. Lee
刊名Acs Nano
出版日期2012
卷号6期号:3页码:1970-1978
ISSN号1936-0851
关键词graphene controllable doping tunable band gaps p-type transport properties boron-doped microwave plasma walled carbon nanotubes ray photoelectron-spectroscopy field-effect transistors high-quality electronic-properties epitaxial graphene films transparent deposition oxide
中文摘要We report tunable band gaps and transport properties of B-doped graphenes that were achieved via controllable doping through reaction with the ion atmosphere of trimethylboron decomposed by microwave plasma. Both electron energy loss spectroscopy and X-ray photoemission spectroscopy analyses of the graphene reacted with ion atmosphere showed that B atoms are substitutionally incorporated into graphenes without segregation of B domains. The B content was adjusted over a range of 0-13.85 atom % by controlling the ion reaction time, from which the doping effects on transport properties were quantitatively evaluated. Electrical measurements from graphene field-effect transistors show that the B-doped graphenes have a distinct p-type conductivity with a current on/off ratio higher than 10(2). Especially, the band gap of graphenes is tuned from 0 to similar to 0.54 eV with Increasing B content, leading to a series of modulated transport properties. We believe the controllable doping for graphenes with predictable transport properties may pave a way for the development of graphene-based devices.
原文出处://WOS:000301945900010
公开日期2013-02-05
源URL[http://ir.imr.ac.cn/handle/321006/60259]  
专题金属研究所_中国科学院金属研究所
推荐引用方式
GB/T 7714
Y. B. Tang,L. C. Yin,Y. Yang,et al. Tunable Band Gaps and p-Type Transport Properties of Boron-Doped Graphenes by Controllable Ion Doping Using Reactive Microwave Plasma[J]. Acs Nano,2012,6(3):1970-1978.
APA Y. B. Tang.,L. C. Yin.,Y. Yang.,X. H. Bo.,Y. L. Cao.,...&C. S. Lee.(2012).Tunable Band Gaps and p-Type Transport Properties of Boron-Doped Graphenes by Controllable Ion Doping Using Reactive Microwave Plasma.Acs Nano,6(3),1970-1978.
MLA Y. B. Tang,et al."Tunable Band Gaps and p-Type Transport Properties of Boron-Doped Graphenes by Controllable Ion Doping Using Reactive Microwave Plasma".Acs Nano 6.3(2012):1970-1978.

入库方式: OAI收割

来源:金属研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。