Study on nanocrystalline Cr2O3 films deposited by arc ion plating: I. composition, morphology, and microstructure analysis
文献类型：期刊论文
| 作者 | T. G. Wang ; D. Jeong ; S. H. Kim ; Q. Wang ; D. W. Shin ; S. Melin ; S. Iyengar ; K. H. Kim |
| 刊名 | Surface & Coatings Technology
 |
| 出版日期 | 2012 |
| 卷号 | 206期号:10页码:2629-2637 |
| 关键词 | Cr2O3 film Arc ion plating Bias voltage Grain size Surface morphology HRTEM chromium-oxide coatings pulsed-laser deposition negative bias voltage si-n coatings thin-films mechanical-properties optical-properties nitrogen pressure vapor-deposition residual-stress |
| ISSN号 | 0257-8972 |
| 中文摘要 | Nanocrystalline Cr2O3 thin films were deposited on silicon wafers with (100) orientation by arc ion plating (AIP) technique at various negative bias voltages. By virtue of X-ray diffraction analysis, scanning electron microscope, and high-resolution transmission electron microscope, the influence of substrate bias voltage on the film growth process, microstructure, and characteristics was investigated systematically, including the phase constituents, grain size, lattice constant, chemical compositions, as well as surface and cross-section morphologies. With increasing the bias voltage, the grain size and lattice constant of AIP Cr2O3 films first decreased slightly, and then increased gradually again. Both reached the minimum (35 nm and 13.57 angstrom) when the bias voltage was - 100 V. However, the bias voltage had little effect on the phase constituents and chemical compositions of AIP Cr2O3 films. During the film growth process, the surfaces of Cr2O3 films were getting smoother with the negative bias voltage increase, in the meantime, their microstructures evolved from coarse columnar grains to fine columnar grains, short columnar recrystallized grains, and fine columnar grains again. (C) 2011 Elsevier B.V. All rights reserved. |
| 原文出处 | |
| 公开日期 | 2013-02-05 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/60305]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | T. G. Wang,D. Jeong,S. H. Kim,et al. Study on nanocrystalline Cr2O3 films deposited by arc ion plating: I. composition, morphology, and microstructure analysis[J]. Surface & Coatings Technology,2012,206(10):2629-2637. |
| APA | T. G. Wang.,D. Jeong.,S. H. Kim.,Q. Wang.,D. W. Shin.,...&K. H. Kim.(2012).Study on nanocrystalline Cr2O3 films deposited by arc ion plating: I. composition, morphology, and microstructure analysis.Surface & Coatings Technology,206(10),2629-2637. |
| MLA | T. G. Wang,et al."Study on nanocrystalline Cr2O3 films deposited by arc ion plating: I. composition, morphology, and microstructure analysis".Surface & Coatings Technology 206.10(2012):2629-2637. |
入库方式： OAI收割
来源：金属研究所
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