Microstructure and ferroelectric properties of epitaxial BaTiO3/SrRuO3/SrTiO3 (001) films grown by pulsed laser deposition under high oxygen pressure
文献类型：期刊论文
| 作者 | X. W. Wang ; X. Wang ; W. J. Gong ; Y. Q. Zhang ; Y. L. Zhu ; Z. J. Wang ; Z. D. Zhang |
| 刊名 | Thin Solid Films
 |
| 出版日期 | 2012 |
| 卷号 | 520期号:7页码:2785-2788 |
| 关键词 | BaTiO3 Films Pulsed laser deposition Ferroelectric properties batio3 thin-films molecular-beam epitaxy dielectric-properties thickness srtio3 |
| ISSN号 | 0040-6090 |
| 中文摘要 | BaTiO3 films were epitaxially grown on SrTiO3 (001) substrates buffered with SrRuO3 films as bottom electrode by pulsed laser deposition under high oxygen pressure of 30 Pa. The quality of the BaTiO3/SrRuO3/SrTiO3 multilayer films was analyzed by means of X-ray diffraction, atomic force microscopy and transmission electron microscopy. BaTiO3 films were found to be highly c-axis-oriented tetragonal phase with c/a = 1.002. The dielectric constant first increased with increasing temperature, and showed a peak at the Curie temperature of about 356 K. The films had well-saturated hysteresis loops with a remnant polarization of 7.3 mu C/cm(2) and a coercive field of 29.5 kV/cm at room temperature. (C) 2011 Elsevier B.V. All rights reserved. |
| 原文出处 | |
| 公开日期 | 2013-02-05 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/60320]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | X. W. Wang,X. Wang,W. J. Gong,et al. Microstructure and ferroelectric properties of epitaxial BaTiO3/SrRuO3/SrTiO3 (001) films grown by pulsed laser deposition under high oxygen pressure[J]. Thin Solid Films,2012,520(7):2785-2788. |
| APA | X. W. Wang.,X. Wang.,W. J. Gong.,Y. Q. Zhang.,Y. L. Zhu.,...&Z. D. Zhang.(2012).Microstructure and ferroelectric properties of epitaxial BaTiO3/SrRuO3/SrTiO3 (001) films grown by pulsed laser deposition under high oxygen pressure.Thin Solid Films,520(7),2785-2788. |
| MLA | X. W. Wang,et al."Microstructure and ferroelectric properties of epitaxial BaTiO3/SrRuO3/SrTiO3 (001) films grown by pulsed laser deposition under high oxygen pressure".Thin Solid Films 520.7(2012):2785-2788. |
入库方式： OAI收割
来源：金属研究所
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