中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Intrinsically limited critical temperatures of highly doped Ga1-xMnxAs thin films

文献类型:期刊论文

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作者Khazen K (Khazen Kh.); von Bardeleben HJ (von Bardeleben H. J.); Cantin JL (Cantin J. L.); Mauger A (Mauger A.); Chen L (Chen L.); Zhao JH (Zhao J. H.); Khazen, K, Univ Paris 06, CNRS, UMR 7588, Inst Nanosci Paris, 140 Rue Lourmel, F-75015 Paris, France.
刊名physical review b ; PHYSICAL REVIEW B
出版日期2010 ; 2010
卷号81期号:23页码:art. no. 235201
关键词AMORPHOUS FERROMAGNET Amorphous Ferromagnet Curie-temperature Critical-behavior Renormalization Group Dipolar Interactions Critical Exponents Magnetic Equation Alloys State Semiconductors CURIE-TEMPERATURE CRITICAL-BEHAVIOR RENORMALIZATION GROUP DIPOLAR INTERACTIONS CRITICAL EXPONENTS MAGNETIC EQUATION ALLOYS STATE SEMICONDUCTORS
通讯作者khazen, k, univ paris 06, cnrs, umr 7588, inst nanosci paris, 140 rue lourmel, f-75015 paris, france.
合作状况国际
英文摘要ga1-xmnxas films with exceptionally high saturation magnetizations of approximate to 100 emu/cm(3) corresponding to effective mn concentrations of x(eff)approximate to 0.10 still have a curie temperature t-c smaller than 195 k contradicting mean-field predictions. the analysis of the critical exponent beta of the remnant magnetization-beta = 0.407(5)-in the framework of the models for disordered/amorphous ferromagnets suggests that this limit on t-c is intrinsic and due to the short range of the ferromagnetic interactions resulting from the small mean-free path of the holes. this result questions the perspective of room-temperature ferromagnetism in highly doped gamnas.; Ga1-xMnxAs films with exceptionally high saturation magnetizations of approximate to 100 emu/cm(3) corresponding to effective Mn concentrations of x(eff)approximate to 0.10 still have a Curie temperature T-C smaller than 195 K contradicting mean-field predictions. The analysis of the critical exponent beta of the remnant magnetization-beta = 0.407(5)-in the framework of the models for disordered/amorphous ferromagnets suggests that this limit on T-C is intrinsic and due to the short range of the ferromagnetic interactions resulting from the small mean-free path of the holes. This result questions the perspective of room-temperature ferromagnetism in highly doped GaMnAs.; submitted by 阎军 (yanj@red.semi.ac.cn) on 2010-06-18t14:45:55z no. of bitstreams: 1 intrinsically limited critical temperatures of highly doped ga1-xmnxas thin films.pdf: 381049 bytes, checksum: 6708a87185de2521a6718ffcd1d1f1fb (md5); approved for entry into archive by 阎军(yanj@red.semi.ac.cn) on 2010-06-18t14:46:18z (gmt) no. of bitstreams: 1 intrinsically limited critical temperatures of highly doped ga1-xmnxas thin films.pdf: 381049 bytes, checksum: 6708a87185de2521a6718ffcd1d1f1fb (md5); made available in dspace on 2010-06-18t14:46:18z (gmt). no. of bitstreams: 1 intrinsically limited critical temperatures of highly doped ga1-xmnxas thin films.pdf: 381049 bytes, checksum: 6708a87185de2521a6718ffcd1d1f1fb (md5) previous issue date: 2010; 国际
学科主题半导体材料 ; 半导体材料
收录类别SCI
语种英语 ; 英语
公开日期2010-06-18 ; 2010-06-18 ; 2010-10-15
源URL[http://ir.semi.ac.cn/handle/172111/11332]  
专题半导体研究所_半导体超晶格国家重点实验室
通讯作者Khazen, K, Univ Paris 06, CNRS, UMR 7588, Inst Nanosci Paris, 140 Rue Lourmel, F-75015 Paris, France.
推荐引用方式
GB/T 7714
Khazen K ,von Bardeleben HJ ,Cantin JL ,et al. Intrinsically limited critical temperatures of highly doped Ga1-xMnxAs thin films, Intrinsically limited critical temperatures of highly doped Ga1-xMnxAs thin films[J]. physical review b, PHYSICAL REVIEW B,2010, 2010,81, 81(23):art. no. 235201, Art. No. 235201.
APA Khazen K .,von Bardeleben HJ .,Cantin JL .,Mauger A .,Chen L .,...&Khazen, K, Univ Paris 06, CNRS, UMR 7588, Inst Nanosci Paris, 140 Rue Lourmel, F-75015 Paris, France..(2010).Intrinsically limited critical temperatures of highly doped Ga1-xMnxAs thin films.physical review b,81(23),art. no. 235201.
MLA Khazen K ,et al."Intrinsically limited critical temperatures of highly doped Ga1-xMnxAs thin films".physical review b 81.23(2010):art. no. 235201.

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来源:半导体研究所

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