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Graph fitting test method for the interpolation error of Moire fringe (EI CONFERENCE)

文献类型：会议论文

作者Sun Y.; Sun Y.
出版日期2009
会议名称9th International Conference on Electronic Measurement and Instruments, ICEMI 2009, August 16, 2009 - August 19, 2009
会议地点Beijing, China
关键词In order to realize the fast test for the interpolation error the graph fitting test method for the interpolation error of Moire fringe is put forward in this paper. Firstly the triangular wave Moire fringe photoelectric signal of the encoder whose phase difference is 90 are sampled to get the Lissajous graph of the two signals. Secondly the single wave represented by the founded subsection function is used to fit the practical Moire fringe Lissajous graph. Then the fitting result is tested to verify whether it satisfies the accuracy requirement. Lastly the founded subsection function instead of the practical wave function is used to calculate the interpolation error. Using the graph fitting method to sample the Moire fringe single of 15-bits photoelectric encoder to get the interpolation error curve the tested maximum interpolation error is 70" and the minimum error is - 69". Comparing with the interpolation error which is received from traditional test method the change trend of the interpolation error curve is similar and peak-peak value is almost equality. The results of experiment indicate that: the equipment is convenient and the examination method is efficient and feasible. The measure speed is fast and the manifestation result is intuitionistic. The system can be used in the working field. The method can avoid the speed influence and realize the dynamic interpolation error measure which is significant for the research of encoder's dynamic accuracy characteristics. 2009 IEEE.
页码2624-2628
收录类别EI
源URL[http://ir.ciomp.ac.cn/handle/181722/33204]  
专题长春光学精密机械与物理研究所_中科院长春光机所知识产出_会议论文
推荐引用方式
GB/T 7714		 Sun Y.,Sun Y.. Graph fitting test method for the interpolation error of Moire fringe (EI CONFERENCE)[C]. 见:9th International Conference on Electronic Measurement and Instruments, ICEMI 2009, August 16, 2009 - August 19, 2009. Beijing, China.

入库方式： OAI收割

来源：长春光学精密机械与物理研究所

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