中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
The automatic photoresist coating machine on the spherical surface (EI CONFERENCE)

文献类型:会议论文

作者Li Y.; Li Y.; Li Y.; Li Y.; Wang H.; Wang H.; Wang H.; Wang H.
出版日期2009
会议名称2009 IEEE International Conference on Mechatronics and Automation, ICMA 2009, August 9, 2009 - August 12, 2009
会议地点Changchun, China
关键词The photoresist coating is an important micro machining process widely applied in engineering. The formed film should be uniform and enough thin to assure the quality of final pattern whose line width is micrometer or nanometer. It is more difficult to process it on the spherical surface than on the flat. In this work mathematic model of film thickness on the spherical surface is proposed by using hydromechanics. The key factors that influence the film thickness are obtained from the analysis of coating process. Then the rational parameters which be controlled by the automatic photoresist coating machine can be final set up according to the result of the coating experiments. And the accuracy analysis of the key part which is used for the main process is performed by the error analytics. This machine not only makes the whole coating process automation but also monitors the film quality in real time. It is adequate for aspheric surface also. 2009 IEEE.
页码3309-3313
收录类别EI
源URL[http://ir.ciomp.ac.cn/handle/181722/33276]  
专题长春光学精密机械与物理研究所_中科院长春光机所知识产出_会议论文
推荐引用方式
GB/T 7714
Li Y.,Li Y.,Li Y.,et al. The automatic photoresist coating machine on the spherical surface (EI CONFERENCE)[C]. 见:2009 IEEE International Conference on Mechatronics and Automation, ICMA 2009, August 9, 2009 - August 12, 2009. Changchun, China.

入库方式: OAI收割

来源:长春光学精密机械与物理研究所

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