中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
The application of auto-controlled liquid crystal light valve arrays to photolithography shutter (EI CONFERENCE)

文献类型:会议论文

作者Chen Y.
出版日期2005
会议名称ICO20: Optical Devices and Instruments, August 21, 2005 - August 26, 2005
会议地点Changchun, China
关键词Photolithography shutter is usually used to control exposure in order to obtain patterns of code disc and metrology grating which are the core components of optical shaft encoder. But perforated film as photolithography shutter has many disadvantages such as taking too long time to perforate easily making wrong code lower reusable ratio. Mathematical models for resist property luminous efficiency and exposure have been established by deducing their relations for avoiding the disadvantages which provides the theory of using liquid crystal light valve (LCLV) replacing proforated film. Based on operating principles of LCLV and control theories of photolithography shutter the principle diagram of control circuit of LCLV arrays has been designed according to theirs control principles. In the control system LCLV arrays as photolithography shutter are realized by adopting DS75451 to drive them and using AT89C51 chip to control them. By photolithographic experiment the patterns of code disc are good the edges of lines are vertical it indicates LCLV arrays as photolithography shutter may control exposure and light passing accords with the intending requires. It proves using LCLV arrays replacing perforated film as photolithography shutter is feasible completely.
收录类别EI
源URL[http://ir.ciomp.ac.cn/handle/181722/33596]  
专题长春光学精密机械与物理研究所_中科院长春光机所知识产出_会议论文
推荐引用方式
GB/T 7714
Chen Y.. The application of auto-controlled liquid crystal light valve arrays to photolithography shutter (EI CONFERENCE)[C]. 见:ICO20: Optical Devices and Instruments, August 21, 2005 - August 26, 2005. Changchun, China.

入库方式: OAI收割

来源:长春光学精密机械与物理研究所

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