中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Optical characteristic of ion beam sputter deposited aluminum thin films (EI CONFERENCE)

文献类型:会议论文

作者Yang H.; Liu L.; Liu L.
出版日期2008
会议名称International Symposium on Photoelectronic Detection and Imaging, ISPDI 2007: Optoelectronic System Design, Manufacturing, and Testings, September 9, 2007 - September 12, 2007
会议地点Beijing, China
关键词Aluminum is a typical active metal very easy to oxidize. An oxide surface layer of about 2-6nm quickly formed in air which adds difficulty to the optical constants determination. An ex-situ method is used to determine the optical constants of aluminum thin films. First Second Third alumina (Al2O3) thin film is deposited by ion beam sputter deposition. The optical constants and thickness are determined by spectral ellipsoemtry (SE). The thickness is verified by grazing x-ray reflection (GXRR) fitting method Al thin film with an Al2O3 cap layer on top is deposited. This cap layer is of the same deposition condition with the first step. By fitting the GXRR spectra based on the acquired structure information the structure information (the thickness of the aluminum and the cap layer the ellipsometric spectra are fitted. The optical constants of the aluminum layer are extracted with the aid of the Drude model. Finally surface roughness and the diffusion between Al-Al2O 3) is obtained an induced transmission filter (ITF) is designed and deposited.
收录类别EI
源URL[http://ir.ciomp.ac.cn/handle/181722/33710]  
专题长春光学精密机械与物理研究所_中科院长春光机所知识产出_会议论文
推荐引用方式
GB/T 7714
Yang H.,Liu L.,Liu L.. Optical characteristic of ion beam sputter deposited aluminum thin films (EI CONFERENCE)[C]. 见:International Symposium on Photoelectronic Detection and Imaging, ISPDI 2007: Optoelectronic System Design, Manufacturing, and Testings, September 9, 2007 - September 12, 2007. Beijing, China.

入库方式: OAI收割

来源:长春光学精密机械与物理研究所

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