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A design of beam shaping unit for 193nm lithography illumination system using angular spectrum theory (EI CONFERENCE)

文献类型：会议论文

作者Zhao Y.; Zhang W.; Zhang W.; Li S.; Gong Y.; Zhao Y.; Zhao Y.
出版日期2010
会议名称6th International Symposium on Precision Engineering Measurements and Instrumentation, August 8, 2010 - August 11, 2010
会议地点Hangzhou, China
关键词Off-axis illumination (OAI) technology is widely used to enhance resolution for deep ultraviolet lithography. The realizing methods of OAI include geometrical optics method and physical optics method. However the former has the disadvantage of weak intensity distribution controlling ability and the latter introduces simulation errors evidently when dealing with near field diffraction propagation. A diffractive optical element (DOE) designing method using plane wave angular spectrum theory is presented in this paper. Several kinds of OAI modes at near field away from DOE can be realized and simulation errors and the size of illuminator are also reduced. According to studying the relationships of the sampling point distance of DOE light beam propagation distance and the structure of the beam shaping unit a method of determining the designing parameters is discussed. Using this method several illumination modes are realized and simulation results show that all diffraction efficiencies reach up to 84%. The method of DOE manufacturing is analyzed at last and it is proven to be feasible. 2010 SPIE.
收录类别EI
源URL[http://ir.ciomp.ac.cn/handle/181722/33786]  
专题长春光学精密机械与物理研究所_中科院长春光机所知识产出_会议论文
推荐引用方式
GB/T 7714		 Zhao Y.,Zhang W.,Zhang W.,et al. A design of beam shaping unit for 193nm lithography illumination system using angular spectrum theory (EI CONFERENCE)[C]. 见:6th International Symposium on Precision Engineering Measurements and Instrumentation, August 8, 2010 - August 11, 2010. Hangzhou, China.

入库方式： OAI收割

来源：长春光学精密机械与物理研究所

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