中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Resolution performance of extreme ultraviolet telescope (EI CONFERENCE)

文献类型:会议论文

作者Yang L.; Chen B.; Chen B.; Liang J.-Q.; Ni Q.-L.; Yang L.
出版日期2009
会议名称4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, November 19, 2008 - November 21, 2008
会议地点Chengdu, China
关键词Extreme Ultraviolet Telescope (EUT) will image solar corona in four EUV narrow bandpasses defined by multilayered coatings deposited on normal incidence optics. In order to make sure it will get sub-arcsecond angular resolution in the mission we have to test its resolution performance on ground. The EUT is aligned by Zygo interferometer first and a global wavefront error of 0.152 peak to valley is obtained ( = 632.8nm ). Because of the difficulty of angular resolution test for EUT at its operating wavelengths we test its optical performance at visible and UV band. The method is to place the resolution test-target on the focal plane of collimator and illuminate the target by visible and UV light espectively then the collimated light will go through EUT and image at focal plane on CCD. By analysis of the images obtained in experiments we conclude that the angular resolution of EUT is 1.22 at visible light ( = 570nm ) which is very close to diffraction limit (1.20) and according to these results we estimate that the operational wavelength resolution is better than 0.32 meets design requirements. While for UV light the angular resolution is 1.53 that is different from diffraction limit (0.53) the error comes mainly from large pixel of EUV camera. 2009 SPIE.
收录类别EI
源URL[http://ir.ciomp.ac.cn/handle/181722/33853]  
专题长春光学精密机械与物理研究所_中科院长春光机所知识产出_会议论文
推荐引用方式
GB/T 7714
Yang L.,Chen B.,Chen B.,et al. Resolution performance of extreme ultraviolet telescope (EI CONFERENCE)[C]. 见:4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, November 19, 2008 - November 21, 2008. Chengdu, China.

入库方式: OAI收割

来源:长春光学精密机械与物理研究所

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