中国科学院机构知识库网格系统: Linearity measurement for image-intensified CCD (EI CONFERENCE)

中国科学院机构知识库网格

Chinese Academy of Sciences Institutional Repositories Grid

Linearity measurement for image-intensified CCD (EI CONFERENCE)

文献类型：会议论文


作者	Zhang L.; Zhao Y.; Zhao Y.; Zhao Y.; Yan F.; Yan F.; Zhang L.
出版日期	2010
会议名称	5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, April 26, 2010 - April 29, 2010
会议地点	Dalian, China
关键词	To the characteristic of the ultraviolet CCD (UV ICCD) technique of the linearity measurement of the UV ICCD camera is studied based on the theory of radiometry. Approach of linearity measurement is discussed and a kind of measurement system of the UV ICCD has been developed based on the method of neutral density filter. It is very important that the transmittance of the filter is independent of the wavelength in the method of neutral density filter. Black metal screen mesh with different transmittance is used in our system and calibration of the filters' transmittance in different working positions has been done. Meanwhile to assure the uniform of the received radiation on the target of the detector at any test points an integrating sphere is placed behind the neutral filter to balance light. The whole measurement system mainly consists of a deuterium lamp with high stabilization the attenuation film with transmission integrating sphere optical guide and electro-shift platform. Auto control is realized via special software during the test. With this instrument the linearity of the UV ICCD was measured. Experimental results show that the nonlinearity of the UV ICCD under fixed-gain is less than 2% and the uncertainty of measurement system is less than 4%. 2010 Copyright SPIE - The International Society for Optical Engineering.
收录类别	EI
源URL	[http://ir.ciomp.ac.cn/handle/181722/33874]
专题	长春光学精密机械与物理研究所_中科院长春光机所知识产出_会议论文
推荐引用方式 GB/T 7714	Zhang L.,Zhao Y.,Zhao Y.,et al. Linearity measurement for image-intensified CCD (EI CONFERENCE)[C]. 见:5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, April 26, 2010 - April 29, 2010. Dalian, China.

入库方式： OAI收割

来源：长春光学精密机械与物理研究所

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