中国科学院机构知识库网格系统: Automatic spin coater for concave spherical substrate (EI CONFERENCE)

中国科学院机构知识库网格

Chinese Academy of Sciences Institutional Repositories Grid

Automatic spin coater for concave spherical substrate (EI CONFERENCE)

文献类型：会议论文


作者	Fengchao L. ; Jingsong G. ; Xiaoguo F. ; Jingli Z. ; Zhijun X. ; Jun H. ; Fenglin X. ; Huiqing W. ; Xiaohan L.
出版日期	2007
会议名称	3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, AOMATT 2007: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, July 8, 2007 - July 12, 2007
会议地点	Chengdu, China
关键词	Coating photoresist film with uniform thickness on concave spherical substrate (CSS) is very important for microfabrication of concave spherical optical elements by lithography technique via a laser direct writer for the uneven photoresist film will result in ununiformity of line width so as to influence the characters of optical elements. For improving the uniformity of photoresist film coating on CSS an automatic spin coater was designed. The process and the mathematical model of spin coating for CSS were analyzed. Difficulties for realizing the spin coater consist of the control of multi-axis motion precisely and collaboratively valves on/ff properly and real-timely. A flexible and well-behaved spinning motion system was achieved by tmeans of principal and subordinate CPUs control. The motion program for spin coating could be created and implemented automatically while the pressure and the valves were was watched and controlled in real time. Film coating and laser direct writing experiments on a CSS with aperture equals to 100 mm and radius equals to 370 mm were performed. Photoresist film with uniform thickness on CSS was obtained by selecting proper spin coating parameters such as rotational speed acceleration and viscosity of the photoresist. After development the section analysis by the atomic force microscope showed that photoresist film thickness was about 517 nm in the center and about 520 nm in the edge of substrate the film thickness error was within 1% and the line width was about 6.0 m with steep sides parallel each other. Experimental results indicate that uniform thickness of thin photoresist film has been coated on CSS by the spin coater which contributes to quality improvement of laser direct writing lines on CSS.
收录类别	EI
源URL	[http://ir.ciomp.ac.cn/handle/181722/33893]
专题	长春光学精密机械与物理研究所_中科院长春光机所知识产出_会议论文
推荐引用方式 GB/T 7714	Fengchao L.,Jingsong G.,Xiaoguo F.,et al. Automatic spin coater for concave spherical substrate (EI CONFERENCE)[C]. 见:3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, AOMATT 2007: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, July 8, 2007 - July 12, 2007. Chengdu, China.

入库方式： OAI收割

来源：长春光学精密机械与物理研究所

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