中国科学院机构知识库网格系统: Development of an experimental EUVL system (EI CONFERENCE)

中国科学院机构知识库网格

Chinese Academy of Sciences Institutional Repositories Grid

Development of an experimental EUVL system (EI CONFERENCE)

文献类型：会议论文


作者	Wang L.-P.; Zhang L.-C.; Jin C.-S.
出版日期	2007
会议名称	3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, AOMATT 2007: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, July 8, 2007 - July 12, 2007
会议地点	Chengdu, China
关键词	An experimental EUVL system has been developed to investigate EUV imaging system design component fabrication assembly technique and experimental process. The system includes a laser produced plasma (LPP) source an ellipsoidal condenser a transmission mask a reduced projection optics and vacuum system. We designed a 10:1 reduction projection optics using Schwarzschild system with spherical mirrors to achieve 0.1m resolution. The Schwarzschild optics coated with Mo/Si multilayers was assembled with wavefront error (WFE) of 0.014 waves RMS at 632.8nm wavelength under computer-aided alignment method. Using this system a fine pattern of less than 0.25m covering a 0.1mm diameter image field of view was clearly replicated on resist-coated wafer.
收录类别	EI
源URL	[http://ir.ciomp.ac.cn/handle/181722/33898]
专题	长春光学精密机械与物理研究所_中科院长春光机所知识产出_会议论文
推荐引用方式 GB/T 7714	Wang L.-P.,Zhang L.-C.,Jin C.-S.. Development of an experimental EUVL system (EI CONFERENCE)[C]. 见:3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, AOMATT 2007: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, July 8, 2007 - July 12, 2007. Chengdu, China.

入库方式： OAI收割

来源：长春光学精密机械与物理研究所

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