中国科学院机构知识库网格系统: Effect of deposition rate on the DUV/VUV reflectance of MgF2 protected aluminum mirrors with e-beam evaporation (EI CONFERENCE)

中国科学院机构知识库网格

Chinese Academy of Sciences Institutional Repositories Grid

Effect of deposition rate on the DUV/VUV reflectance of MgF2 protected aluminum mirrors with e-beam evaporation (EI CONFERENCE)

文献类型：会议论文


作者	Wang T.-T.; Gao J.-S.
出版日期	2011
会议名称	7th International Conference on Thin Film Physics and Applications, September 24, 2010 - September 27, 2010
会议地点	Shanghai, China
关键词	Aluminum mirrors were freshly fabricated under optimum conditions protected with MgF2 at various deposition rates which evaporated by e-beam. All the samples were deposited on fine polished fused silica substrate. The reflectance results were measured by Mcpherson Vuvas2000 spectrometer in DUV/VUV spectral region from 150nm to 350nm. The highest reflectance is chosen to 210nm and the point of 160nm is also very important for the project so the results of two points are detailed presented. The highest average reflectance is about 86.76% with the MgF2 deposition rate at 1.2nm/s. The effects of aging on the reflectance of the MgF2 protected aluminum mirrors are discussed. 2011 SPIE.
收录类别	EI
源URL	[http://ir.ciomp.ac.cn/handle/181722/33956]
专题	长春光学精密机械与物理研究所_中科院长春光机所知识产出_会议论文
推荐引用方式 GB/T 7714	Wang T.-T.,Gao J.-S.. Effect of deposition rate on the DUV/VUV reflectance of MgF2 protected aluminum mirrors with e-beam evaporation (EI CONFERENCE)[C]. 见:7th International Conference on Thin Film Physics and Applications, September 24, 2010 - September 27, 2010. Shanghai, China.

入库方式： OAI收割

来源：长春光学精密机械与物理研究所

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