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Immersed nanospheres super-lithography for the fabrication of sub-70nm nanoholes with period below 700nm (EI CONFERENCE)

文献类型：会议论文

作者Li S.; Du J.; Shi L.
出版日期2012
会议名称2012 12th IEEE International Conference on Nanotechnology, NANO 2012, August 20, 2012 - August 23, 2012
会议地点Birmingham, United kingdom
关键词A maskless nano-lithography method by using polystyrene spheres (PSs) self-assembled on silver slab (NSSL) was proposed in [optics express Vol. 16 No. 19 (2008) 14397]. Following that to break the limitations in resolution and PSs period of NSSL method in this paper we present PSs immersed super-resolution lithography (NSISL) technology by embedding the PSs into appropriate material to improve the efficiency of the surface plasmon excitation. The energy modulating mechanism and the rules of the resolution affected by silver slab were studied by calculating and analysing the energy distribution. The curve of the lithography resolution versus the silver thickness was presented. In order to verify this method contrast analysis was carried out with NSSL. The results show that the lithography resolution is improved efficiently. Taking a specific configuration with PS diameter of 600nm as an example the resolution was improved to 54nm from 190nm with Ag thickness of 25nm. Based on the calculation results we carried out the experiments. Nano holes with dimension of 75nm and period of 600nm were obtained. 2012 IEEE.
收录类别EI
源URL[http://ir.ciomp.ac.cn/handle/181722/34017]  
专题长春光学精密机械与物理研究所_中科院长春光机所知识产出_会议论文
推荐引用方式
GB/T 7714		 Li S.,Du J.,Shi L.. Immersed nanospheres super-lithography for the fabrication of sub-70nm nanoholes with period below 700nm (EI CONFERENCE)[C]. 见:2012 12th IEEE International Conference on Nanotechnology, NANO 2012, August 20, 2012 - August 23, 2012. Birmingham, United kingdom.

入库方式： OAI收割

来源：长春光学精密机械与物理研究所

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