Thermal annealing of colloidal monolayer at the air/water interface: a facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography
文献类型：期刊论文
| 作者 | Geng C (Geng, Chong) ; Zheng L (Zheng, Lu) ; Yu J (Yu, Jie) ; Yan QF (Yan, Qingfeng) ; Wei TB (Wei, Tongbo) ; Wang XQ (Wang, Xiaoqing) ; Shen DZ (Shen, Dezhong) |
| 刊名 | journal of materials chemistry
 |
| 出版日期 | 2012 |
| 卷号 | 22期号:42页码:22678-22685 |
| 学科主题 | 光电子学 |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-04-02 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/23869]  |
| 专题 | 半导体研究所_集成光电子学国家重点实验室 |
| 推荐引用方式 GB/T 7714 | Geng C ,Zheng L ,Yu J ,et al. Thermal annealing of colloidal monolayer at the air/water interface: a facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography[J]. journal of materials chemistry,2012,22(42):22678-22685. |
| APA | Geng C .,Zheng L .,Yu J .,Yan QF .,Wei TB .,...&Shen DZ .(2012).Thermal annealing of colloidal monolayer at the air/water interface: a facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography.journal of materials chemistry,22(42),22678-22685. |
| MLA | Geng C ,et al."Thermal annealing of colloidal monolayer at the air/water interface: a facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography".journal of materials chemistry 22.42(2012):22678-22685. |
入库方式： OAI收割
来源：半导体研究所
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