The effect of hydrogen on copper nitride thin films deposited by magnetron sputtering
文献类型：期刊论文
| 作者 | Zhang GA(张广安) ; Chen JT(陈江涛)
|
| 刊名 | Applied Surface Science
 |
| 出版日期 | 2008 |
| 卷号 | 254页码:5012-5015 |
| 关键词 | Copper nitride Thin films Hydrogen Structure Thermal properties |
| ISSN号 | 0169-4332 |
| 通讯作者 | 阎鹏勋 |
| 中文摘要 | Copper nitride thin films were deposited on Si (1 0 0) wafers by reactive magnetron sputtering at various H2/N2 ratios. X-ray diffraction measurements show that the films are composed of Cu3N crystallites with anti-ReO3 structure and exhibit preferred orientation of [1 0 0] direction. Although the relative composition of the films has obviously changes with the H2/N2 ratios, the orientations of the films keep almost no changes. However, the grain size, lattice parameter and composition of the films are strongly dependent on the H2/N2 ratios. The copper nitride films prepared at 10% H2/N2 ratios show poor stability and large weight gain compared to the copper nitride films prepared at 0% H2/N2 ratios. |
| 学科主题 | 材料科学与物理化学 |
| 收录类别 | SCI |
| 资助信息 | Natural Science Foundation of China (Granted No 50772115) |
| 语种 | 英语 |
| WOS记录号 | WOS:000255728500015 |
| 公开日期 | 2013-03-28 |
| 源URL | [http://210.77.64.217/handle/362003/2583]  |
| 专题 | 兰州化学物理研究所_固体润滑国家重点实验室 |
| 推荐引用方式 GB/T 7714 | Zhang GA,Chen JT. The effect of hydrogen on copper nitride thin films deposited by magnetron sputtering[J]. Applied Surface Science,2008,254:5012-5015. |
| APA | 张广安,&陈江涛.(2008).The effect of hydrogen on copper nitride thin films deposited by magnetron sputtering.Applied Surface Science,254,5012-5015. |
| MLA | 张广安,et al."The effect of hydrogen on copper nitride thin films deposited by magnetron sputtering".Applied Surface Science 254(2008):5012-5015. |
入库方式： OAI收割
来源：兰州化学物理研究所
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